ASML's rise to dominance in lithography technology resulted from a combination of strategic decisions, partnerships, and sheer timing. Initially, ASML was not at the forefront but was invited to join a U.S. government consortium due to a lack of domestic capability and a desire to protect advanced technology from the Japanese semiconductor industry. This collaboration led to significant investment in extreme ultraviolet (EUV) technology, crucial for the advancement of semiconductor manufacturing. Despite facing delays in the rollout of EUV machines, ASML secured substantial funding from industry giants like Intel, Samsung, and TSMC, which not only provided critical R&D resources amounting to 1.4 billion euros but also a 23% stake in the company. The eventual release of EUV machines marked a turning point, enabling smaller, high-quality semiconductor patterns at reduced costs, reaffirming ASML's pivotal role in sustaining Moore's law and transforming the semiconductor landscape.

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