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Chinghua University's purported breakthrough in generating extreme ultraviolet (EUV) light sources for advanced lithography machines created a buzz in China's tech community. Despite initial excitement and speculations about a lithography factory under construction, science writer Jia Wang poured cold water on these rumors. Wang highlighted the challenges involved in independently developing lithography machines, emphasizing the intricate technical requirements and the necessity for complete innovation in all three key components to achieve a breakthrough.