Asianometry

ASML’s Breakthrough 3-Pulse EUV Light Source

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Apr 27, 2025
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INSIGHT

Tin Ionization Powers EUV Photons

  • EUV photons require highly ionized tin atoms stripped of 8 to 12 electrons to produce the 13.5 nanometer wavelength light.
  • This ionization to plasma enables the high energy 92 electron volt photon emission essential for EUV lithography.
INSIGHT

Key Metrics for EUV Power

  • EUV power depends on CO2 laser power hitting the tin droplets and the conversion efficiency of laser power to EUV light.
  • Improving conversion efficiency is key because power gains directly reduce tool ownership cost and improve EUV output.
ANECDOTE

NOMO Laser System Attempt

  • ASML attempted a NOMO laser system where the tin droplet acts as a laser cavity mirror enabling self-timing.
  • Despite ingenuity, the fast-moving droplets prevented laser gain buildup and soot debris hindered operation, so it was abandoned.
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