
ASML’s Breakthrough 3-Pulse EUV Light Source
Asianometry
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Innovations in EUV Light Source: The Transition to Three Laser Pulses
This chapter explores ASML's shift from a two-pulse to a three-pulse system to enhance the power output of extreme ultraviolet light sources. It highlights the mechanics and benefits of the new approach, including improved efficiency and reduced debris, aiming for energy outputs upwards of 800 watts in semiconductor manufacturing.
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