Evolution and Challenges of Photoresists in Semiconductor Manufacturing

For nearly forty years, Chemically Amplified Resists or CARs (say it separately) dominated the semiconductor industry. But technological changes present opportunities for major industrial shifts. And the introduction of EUV is perhaps the biggest technological change in the past 10 years. EUV's rise has opened the door to a perhaps-revolutionary new photoresist, and two very interesting new players supporting them. In this video, we talk about the new metal oxide and dry resists, developed for the EUV era and beyond.

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