At the 2024 SPIE Advanced Lithography and Patterning Symposium, Ann Kelleher, a top Intel manufacturing executive, mentioned something called Directed Self-Assembly or DSA. In that presentation, she called DSA a key innovation for cost-effective scaling, and said it had to be brought to High Volume Manufacturing. Intel later presented results of a DSA workflow that can "heal" errors in EUV lithography - potentially cutting costs by a dramatic amount. But what is DSA? DSA has been around for over 30 years. It was once positioned to be a replacement for photolithography, but now is seen as a complement to it. But will the fabs adopt it? In today’s video, a bottoms-up way to pattern the ever-shrinking lines of our semiconductors: Directed Self Assembly, or DSA.
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