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Navigating EUV Lithography: Challenges and Innovations
This chapter explores the significance of extreme ultraviolet (EUV) lithography in microchip manufacturing, detailing the technical challenges of producing EUV light and the complexities of the necessary machinery. It highlights the collaborative efforts and investments made by companies to advance this technology, particularly in achieving two nanometer chip dimensions. The discussion concludes with an optimistic outlook on the future of semiconductor innovation, emphasizing the importance of sustained growth and collaboration in the industry.