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2min chapter
HIGHLIGHTS: Christophe Fouquet - CEO of ASML
In Good Company with Nicolai Tangen
Understanding the Challenges and Innovations in EUV Lithography
This chapter explores the fundamentals of extreme ultraviolet (EUV) lithography, detailing its short wavelength of 13.5 nanometers and its role in creating finer features. It also addresses the challenges in generating adequate EUV light for industry use, while emphasizing the need for innovation in energy efficiency and cost management to keep pace with advancements in AI and memory technologies.
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